Part 3/10:
Historically, the development of EUV lithography has been a challenging endeavor, requiring years of expertise and significant investments in state-of-the-art technology. The traditional frontrunners—such as the United States, Japan, and Germany—have engaged in decades-long research and engineering to develop advanced lithography machines. The high level of precision required for the mirrors and light sources used in EUV systems meant that producing an effective machine was considered a significant technical hurdle.