Current Low-NA EUV scanners require up to 1,170 kW, and next-gen High-NA tools are projected to need as much as 1,400 kW per unit (according to TechInsights). The number of these machines installed at fabs operated by Intel, Micron, Samsung, SK hynix, and, of course, TSMC, increases every year.
TechInsights believes that by 2030, the number of fabs with EUV scanners will increase from 31 today to 59, and the number of tools in operation will approximately double. As a result, all the installed EUV systems will consume 6,100 GW/year of power, which suggests that hundreds of the machines will be operational by then.